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Author, Editor

Author(s):

Hopf, Jörn

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Editor(s):

Claus, Volker
Hopf, Jörn
Schwefel, Hans-Paul

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dblp
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BibTeX Citekey*:	Hopf96b
Language:	English

Title, Institution

Title*:	Optimizing Photo Mask Layout for Grey-tone Lithography
Institution*:	IBFI
Publishers or Institutions Address*:	IBFI GmbH, Schloss Dagstuhl, D-66687 Wadern, Germany
Type:	Dagstuhl-Seminar-Report

No, Year, pp.,

Number*:	140	Pages*:	1
Month:	March	VG Wort Pages*:
Year*:	1996	ISBN/ISSN:	0940-1121

DOI:

Note, Abstract, ©

Note:
(LaTeX) Abstract:
Categories / Keywords:
Copyright Message:
HyperLinks / References / URLs:	http://www.dag.uni-sb.de/reporte/liste.96.html
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Download Access Level:	Public

Correlation

MPG Unit:	Max-Planck-Institut für Informatik

MPG Subunit:	Programming Logics Group
Audience:	Expert
Appearance:	MPII WWW Server, MPII FTP Server, MPG publications list, university publications list, working group publication list, Fachbeirat

BibTeX Entry:

@TECHREPORT{Hopf96b,
AUTHOR = {Hopf, J{\"o}rn},
EDITOR = {Claus, Volker and Hopf, J{\"o}rn and Schwefel, Hans-Paul},
TITLE = {Optimizing Photo Mask Layout for Grey-tone Lithography},
YEAR = {1996},
TYPE = {Dagstuhl-Seminar-Report},
INSTITUTION = {IBFI},
NUMBER = {140},
PAGES = {1},
ADDRESS = {IBFI GmbH, Schloss Dagstuhl, D-66687 Wadern, Germany},
MONTH = {March},
ISBN = {0940-1121},
}

Entry last modified by Uwe Brahm, 03/12/2010

Edit History (please click the blue arrow to see the details)

	Editor(s)	Created 03/05/1997 05:49:19 PM
Revisions 4. 3. 2. 1. 0.	Editor(s) Uwe Brahm Jörn Hopf Jörn Hopf Jörn Hopf Jörn Hopf	Edit Dates 04.03.2007 02:35:13 26/02/97 21:28:39 26/02/97 21:26:34 25/02/97 18:54:05 25/02/97 18:53:11

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