Technical, Research Report
@TechReport
Technischer-, Forschungsbericht


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Author, Editor
Author(s):
Hopf, Jörndblp
Editor(s):
Claus, Volker
Hopf, Jörn
Schwefel, Hans-Paul		dblp
dblp
dblp

BibTeX Citekey*:

Hopf96b

Language:

English

Title, Institution

Title*:

Optimizing Photo Mask Layout for Grey-tone Lithography

Institution*:

IBFI

Publishers or Institutions Address*:

IBFI GmbH, Schloss Dagstuhl, D-66687 Wadern, Germany

Type:

Dagstuhl-Seminar-Report

No, Year, pp.,

Number*:

140
Pages*:

1

Month:

March
VG Wort
Pages*:


Year*:

1996
ISBN/ISSN:

0940-1121





DOI:




Note, Abstract, ©

Note:


(LaTeX) Abstract:


Categories / Keywords:


Copyright Message:


HyperLinks / References / URLs:

http://www.dag.uni-sb.de/reporte/liste.96.html

Personal Comments:


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Correlation
MPG Unit:
Max-Planck-Institut für Informatik
MPG Subunit:
Programming Logics Group
Audience:
experts only
Appearance:
working group publication list


BibTeX Entry:
@TECHREPORT{Hopf96b,
AUTHOR = {Hopf, J{\"o}rn},
 EDITOR = {Claus, Volker and Hopf, J{\"o}rn and Schwefel, Hans-Paul},
 TITLE = {Optimizing Photo Mask Layout for Grey-tone Lithography},
 YEAR = {1996},
 TYPE = {Dagstuhl-Seminar-Report},
 INSTITUTION = {IBFI},
 NUMBER = {140},
 PAGES = {1},
 ADDRESS = {IBFI GmbH, Schloss Dagstuhl, D-66687 Wadern, Germany},
 MONTH = {March},
 ISBN = {0940-1121},
}

Entry last modified by Uwe Brahm, 08/28/2014
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Editor(s)
[Library]		Created
05/28/1997 04:32:40 PM
Revisions
5.
4.
3.
2.
1.		Editor(s)
Uwe Brahm
Uwe Brahm
Jörn Hopf
Jörn Hopf
Jörn Hopf		Edit Dates
24.03.97 22:41:08
05.03.97 17:56:17
26/02/97 21:28:39
26/02/97 21:26:34
25/02/97 18:54:05